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Silicon Nitride Thermal Substrate Coarse Lapping Slurry

Product Overview


SR-15 μm is designed for coarse lapping of silicon nitride ceramic substrates. It provides stable performance, high removal rate, and good surface quality, with surface roughness controlled at 0.2–0.5 μm. It effectively improves surface unevenness after ceramic substrate sintering, delivering excellent warp and TTV performance, as well as a shallow surface damage layer after lapping. Particle size can be customized upon request.


Parameter

ModelParticle Size/μmAppearance

Compatible Plate /

Material

pH ValueStorage Stability
SR-15μm10-20White slurryCast iron lapping plate7.0-8.5Stable for 1 year


Application

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